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45 nanometer
Last modified: Friday, February 22, 2008 


45 nanometer (45 nm) is the buzzword of choice (2007-2008) for an advanced semiconductor manufacturing process that Intel used for mass chip production, starting in late 2007. The 45 nanometer manufacturing process uses new materials, including hafnium-based high-k gate dielectrics and metal gates, to reduce electrical current leakage in transistors. Contrast with 90 nanometer.

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Introducing the 45nm Next-Generation Intel Core Micro architecture (PDF)
Intel's January 2007 demonstration of the world's first 45nm Hi-k processor underscored its process technology lead of more than two years over the rest of the semiconductor industry.


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